The Parallel Simulation Model for Thin Film Deposition Using the DSMC Method

Nowadays, the thin film deposition process is essential in the semiconductor fabrication process and used extensively in many applications. Progress in each of these areas depends upon the ability to selectively and controllably deposit thin films. This paper proposes a design framework and implementation of the simulation of thin film deposition processes. This presented work focuses on the deposition processes in twodimensional geometries and the simulation is considered in the context of neutral flow Direct Simulation Monte Carlo (DSMC) simulations for semiconductor fabrication. Parallel computing is employed to improve the performance optimization of the system. This paper describes the simulation method and algorithms that are used to implement the simulation on a parallel system and presents the results of thin film deposition simulation.